Automatic Program Controlled Three Target Magnetron Sputtering Coating Instrument for Oxide Film

Automatic Program Controlled Three Target Magnetron Sputtering Coating Instrument for Oxide Film. Three independent magnetron sputtering cathodes design, support sequential sputtering, prepare multi-layer alloy & composite thin films without replacing targets frequently. Intelligent PLC + Touch Screen integrated control system, all coating parameters programmable, realize fully automatic unattended deposition process. High vacuum sealed stainless steel chamber, matched complete vacuum pumping unit, achieve high vacuum environment to reduce thin film impurity contamination.