Laboratory 4 Inch Programmable Spin Coater for Photoresist Process

Laboratory 4 Inch Programmable Spin Coater for Photoresist Process. Customizable Vacuum Chucks: Available in 10/25/55/100mm sizes with customization options for specific substrate needs. Precise Speed Control: Variable spin speed from 0 to 10000rpm with 1rpm resolution for uniform thin film deposition. Multi-Stage Programming: Store up to 5 curves, each with 5 segments, for complex coating process automation. User-Friendly Interface: Equipped with a 7-inch HD LCD touch screen for intuitive operation and monitoring. Versatile Substrate Support: Suitable for silicon wafers, crystals, quartz, ceramics, and other substrates up to 4 inches. High-Speed Pumping: Oil-less dry mechanical pump provides 50L/min pumping speed for efficient vacuum coating. Professional Manufacturer: Direct factory with R&D team, ensuring quality, customization, and lifetime maintenance support.