Versatile Three Target Power Supply Magnetron Sputtering Coater for Dielectric Film Coating

Versatile Three Target Power Supply Magnetron Sputtering Coater for Dielectric Film Coating. Uniform gas flow and excellent film uniformity The D-shaped arc-profile inner chamber eliminates right-angled dead zones, ensuring smooth flow fields for argon and reactive gases. Gas distribution rem. High vacuum pumping speed and minimal residual contamination. The arc-shaped chamber design offers low airflow resistance and eliminates dead zones for the molecular pump; with an identical pump confi. High space utilization with compatibility for various sample specifications. Featuring a combination of flat edges and curved sides, the design accommodates flat substrate holders, vertical sample rac. Visual monitoring ensures an intuitive and controllable experimental process. The curved side door comes standard with a large, tempered vacuum viewing window that offers an unobstructed view, allowin.