Customizable Chemical Vapor Deposition CVD Tuber Furnace with Gas System for Film Growing

Name: Customizable Chemical Vapor Deposition CVD Tuber Furnace with Gas System for Film Growing
Brand: Zhengzhou CY Scientific Instrument Co., Ltd.
SKU: VQdrDUFLaHRt
Price: 1085500 INR

5.0InStock Source-listed auditby Zhengzhou CY Scientific Instrument Co., Ltd.

₹10,85,500≈ $13,000 · indicative, confirm with supplier

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Description

Customizable Chemical Vapor Deposition CVD Tuber Furnace with Gas System for Film Growing. Low Temperature Deposition: Plasma activation enables chemical vapor deposition at low temperatures for enhanced reaction efficiency. Customizable Heating Zones: Available in single, dual, or triple heating zones based on specific process requirements. Flexible Tube Materials: Tube material can be customized to quartz, corundum, alloy, or other materials. Adjustable Plasma Power: Plasma generator power options include 150W, 300W, 500W, and 1000W for various applications. Multi-Channel Gas System: Flow meter options range from 1 to 3 or multi-channel based on specific process needs. Wide Film Application: Suitable for depositing SiOx, SiNx, amorphous silicon, and other films on various substrates.