Continuous Inline Magnetron Sputtering System for Architectural Glass, Displays, Solar Panels, Decorative Coatings, and Functional Thin Films High Uniformity

Continuous Inline Magnetron Sputtering System for Architectural Glass, Displays, Solar Panels, Decorative Coatings, and Functional Thin Films High Uniformity. High Uniformity Coating: Thickness variation within +/- 2% across substrate width using linear magnetron cathodes. High Throughput Production: Line speeds from 0.2 to 8 meters per minute with annual capacity up to 1,000,000 sq meters. Flexible Substrate Handling: Handles glass widths 600-3300mm and thickness 0.3-19mm, plus wafers and metal sheets. Multi-Cathode Configuration: Accommodates 4 to 20 sputtering cathodes for single, multi-layer, and gradient coatings. Energy Efficient Operation: Target utilization up to 90% for rotatable types, reducing energy consumption significantly. Fast Maintenance Access: Individual chamber sections with gate valves allow target changes without venting the entire line. Fully Automated Control: PLC and SCADA system with recipe management, real-time monitoring, and remote diagnostics. Customizable Equipment: Custom options for vacuum pumping, gas distribution, coating systems, and chamber configurations.