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University Experiment Plasma Cleaning Plasma Cleaner for Wafer Etching. Advanced Control System: Equipped with PLC and touch screen for precise operation. Versatile Gas Options: Supports Ar, O2, N2, and Air for various plasma processes. Durable Chamber Material: Constructed with 304 stainless steel for longevity. Wide Application Range: Ideal for cleaning, etching, plating, and surface modification. CE and ISO Certified: Meets international safety and quality standards. Customization Services: Offers OEM, ODM, and flexible customization options. Rapid Delivery: 3-5 working days for stock items, 6-8 days for custom orders. Comprehensive Warranty: 1-year warranty with free spare parts (buyer pays freight).