High Purity Zn Metal Zinc Plate Sputtering Target for PVD Machine

Name: High Purity Zn Metal Zinc Plate Sputtering Target for PVD Machine
Brand: Changsha Xinkang Advanced Materials Co., Ltd.
SKU: uyEmAsNLnVkF
Price: 1670 INR

5.0InStock Source-listed auditby Changsha Xinkang Advanced Materials Co., Ltd.

₹1,670≈ $20 · indicative, confirm with supplier

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Incoterms

FOB, CIF, CFR, EXW

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Description

High Purity Zn Metal Zinc Plate Sputtering Target for PVD Machine. High Purity Material: 99.99% purity with special annealing treatment for uniform grain size. Customized Size: Available in customized dimensions to meet specific application needs. Versatile Applications: Ideal for LED, OLED luminescent films, transparent conducting films, and solar cells. Low Gas Content: Ensures constant erosion rates and homogeneous thin film coating during PVD. Multiple Certifications: Certified by TUV, ISO, and CE standards for quality assurance. Flexible Customization: Offers full, minor, and sample-based customization options. Fast Delivery: Standard delivery within 5-10 days for most orders. Low MOQ: Minimum Order Quantity starts from just 1 piece.