High Precision RF and DC Triple Target Magnetron Sputtering Equipment for Optical Coatings and Semiconductor Thin Films

High Precision RF and DC Triple Target Magnetron Sputtering Equipment for Optical Coatings and Semiconductor Thin Films. AC/DC fully compatible, suitable for all types of target materials Three targets can be freely configured with power supply combinations (2 DC + 1 RF standard, interchangeable as needed). High vacuum stable chamber with strong process repeatability Optional quartz crystal diaphragm thickness monitoring, thickness accuracy of 1nm level, automatic closed-loop thickness control. Modular whole machine design, easy to maintain and flexible to expand Vacuum chamber, vacuum pump, power supply, and electronic control modular, easy to disassemble, clean, and maintain. Multi functional substrate platform, compatible with multiple scene processes The sample stage is electrically adjustable, rotating, and temperature controlled, with a wide temperature range of room t.