High Purity Carbon Tetrafluoride CF4 Gas for Industrial Use

High Purity Carbon Tetrafluoride CF4 Gas for Industrial Use. Ultra-High Purity: Purity reaches 99.999% with total impurities under 10 ppm. Microelectronics Etching: Primary plasma etching gas for silicon, silicon dioxide, and tungsten films. Non-Flammable Safety: Classified as Non-Flammable Gas (DOT Class 2.2) for safe industrial handling. Versatile Applications: Used in solar cells, laser tech, cryogenic refrigeration, and rocket attitude control. Strict Quality Control: Comprehensive COA provided with precise analysis for all impurity components. Reliable Supply Chain: Based in Qingdao with convenient shipping advantages and competitive pricing. Technical Expertise: Unparalleled technical knowledge and support from experienced professionals.