| CAS No | 7440-58-6 |
| Density | 13.31 G/cm³ |
| EINECS No | 231-166-4 |
| Model NO. | ET-HfM-02 |
| Product name | Hafnium Metal |
Hafnium Metal Hf 99.99% High Purity for Semiconductor Films, Sputtering Targets and Electron Beam Evaporation. 99.99% High Purity. High Purity Hafnium Source. Suitable for Sputtering Targets. Suitable for Electron Beam Evaporation. Suitable for Hafnium Based Films.