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Plasma Surface Processor Plasma Cleaning Machine. Versatile Plasma Treatment: Cleans, modifies, etches, and coats surfaces for semiconductors, electronics, and medical devices. Adjustable RF Power: RF power ranges from 0-300W to 0-600W, ensuring precise control for various cleaning tasks. Precise Vacuum Control: Vacuum degree adjustable from 1Pa to 1000Pa with automatic impedance matching for stability. Flexible Process Control: PLC and MCU interfaces support automatic and manual modes with adjustable gas flow and time. Customization Support: Offers OEM/ODM services and flexible customization options from samples or designs.