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Pecvd Chemical Vapor Deposition System for Amorphous Silicon and Microcrystalline Silicon Films
5.0InStock Source-listed auditby Zhengzhou CY Scientific Instrument Co., Ltd.
₹59,28,500≈ $71,000 · indicative, confirm with supplier
Description
Pecvd Chemical Vapor Deposition System for Amorphous Silicon and Microcrystalline Silicon Films, Find Details and Price about Pecvd Plasma Enhanced Chemical Vapor Deposition from Pecvd Chemical Vapor Deposition System for Amorphous Silicon and Microcrystalline Silicon Films - Zhengzhou CY Scientific Instrument Co., Ltd.
Specifications
TypeTubular Furnace
OriginZhengzhou Henan China
HS Code8401200000
MaterialStainless Steel
Model NO.CY-PECVD-500T-SS
StructureDesktop
TrademarkCYKY
CustomizedCustomized
ApplicationIndustry, School, Lab
Heating ZoneSingle Heating Zone 200mm
Package Size1400.00cm * 800.00cm * 1500.00cm
CertificationCE
